双（二乙基氨基）硅烷 , 97%
Bis(diethylamino)silane, 97% BDEAS
分子式: SiH2[N(CH2CH3)2]2
分子量: 174.36
纯度: 97%
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Technical Notes:
1.Plasma-Assisted ALD for the Conformal Deposition of SiO2
Room-Temperature ALD of Metal Oxide Thin Films by Energy- Enhanced AL D
2.Atomic L ayer Deposition of Silica on Carbon Nanotubes
3.Area-Selective Atomic L ayer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
References:
1.J. Electrochem. Soc., 2012, 159, H277.
2.Chem. Vap. Deposition, 2013, 19, 125.
3.Chem. Mater., 2017, 29, 4920.
4.ACS Nano, 2017, 11, 9303.
