双(1,4-二叔丁基-1,3-二氮杂丁二烯基)钴(II) , min. 98% (99.999%-Co)
Bis(1,4-di-t-butyl-1,3-diazabutadienyl)cobalt(II) Co(DAD)2, min. 98% (99.999%-Co) PURATREM
分子式: C20H40CoN4
分子量: 395.49
纯度: min. 98% (99.999%-Co)
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基本信息
安全信息
化学和物理性质
产品描述
Technical Notes:
1. Volatile and thermally stable precursor for the growth of Co containing thin films by ALD and CVD. 2.The high reactivity of the precursor enables the growth of pure Co metal films at low temperatures with various
reducing agents .
References:
1.Organometallics 2011 30. 5010.
2.Chem. Mater. 2016 28 700
3.Chem. Mater 2017 29 5796
4.Chem Mater 2017 29 7458
5.J. Chem. Phys.2017 146 052813.
6.Nano Res 2019 13 570
7.J Magn. Magn. Mater 2020 509 166885.
8.Appl Surf Sci 2020 510 144804.
