全部
(99.9+%-Nb)
(99.99%-Ti)
(99.99+%-Ge)
(99.99+%-Ta
(99.9999%-Ta)
>96%
>97%
>98%
~10% in methanol (T, ~2.2 M)
~20% in H2O (T)
~20% in methanol (T)
~25% in H2O (1.68 M)
~25% in methanol (~1.5 M)
~25% in methanol (T)
~40% in H2O (T)
≥95.0% (T)
≥95%
≥97.0%
≥97%
≥98.0% (GC)
≥98%
≥99.5%
≥99.95% trace metals basis
≥99.99% trace metals basis
≥99%
0.5 M in benzene: cyclohexane
0.5 M in THF
0.5 M in toluene
1 M in tert-butyl methyl ether
1 M in THF
1 M in toluene
1.0 M in ethanol
1.0 M in heptane
1.0 M in methanol
1.0 M in tert-butyl methyl ether
1.0 M in THF
1.0 M in THF/hexanes
1.3 M in THF
1.4 M in THF
1.4 M in THF: toluene (1:3)
10 wt. % in H2O
2 M in THF
2.0 M in diethyl ether
2.0 M in THF
2.0 M in THF/heptane/ethylbenzene
2.9 M in 2-methyltetrahydrofuran
20%
20% in methanol (NT)
21% in H2O
24.0-26.0% (in H2O)
25 wt. % in H2O
25 wt. % in methanol
3.1 M in diethoxymethane
3.4 M in 2-methyltetrahydrofuran
35 wt. % in H2O
39-42%Titr
40 wt. % in H2O
40 wt. % in methanol
40% in THF
45 wt. % in methanol
6-10 wt. % in methanol
66.0-72.0% in H2O
75 wt. % in isopropanol
80 wt. % in isopropanol
85%
90%
90%, technical grade
95.0%(GC&T)
95.0%(T)
95%
95+%
96.0%(T)
97.0%(GC)
97.0%(T)
97%
98.0%(GC)
98.0%(GC&T)
98.0%(LC&T)
98.0%(T)
98.5%
98%
99.0%(GC)
99.0%(GC&T)
99.0%(T)
99.5%
99.7%
99.8%
99.9%
99.9% trace metals basis
99.95% trace metals basis
99.98% trace metals basis
99.99%
99.99% trace metals basis (purity excludes ~2000 ppm zirconium.)
99.999% trace metals basis
99%
99+%
ACS reagent
ACS reagent, 0.5 M CH3ONa in methanol (0.5N)
Arxada quality, ≥97.0 % (w/w) (T)
deposition grade
electronic grade, 99.999% trace metals basis
min. 90%
min. 95%
min. 97%
min. 98%
min. 99%
N/A
packaged for use in deposition systems
purified by redistillation, 99.5%
ReagentPlus?, ≥99%
technical, ~25% in toluene (T, ~1.7 M)
technical, ≥90% (KT)