在使用化学气相沉积（CVD）和原子层沉积（ALD）技术时，前驱体源的选择是至关重要的，它们直接影响到最终薄膜的质量、性质和沉积过程。
    在使用这些前驱体源时，以下因素需要考虑：
    挥发性：前驱体需要能够在较低的温度下挥发，以便在CVD/ALD反应器中形成气态。
    稳定性：前驱体在储存和使用过程中需要保持化学稳定，不易分解。
    反应性：前驱体需要在CVD/ALD的特定条件下具有适当的反应性，以便有效地形成所需的薄膜。
    安全性：某些前驱体可能具有毒性和/或易燃性，因此需要采取适当的安全措施。
    百灵威可提供多种CVD/ALD前驱体源，种类丰富，纯度高，欢迎大家选购。
    产品列表：

品名	CAS	货号
Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)bismuth(III), 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 三(2,2,6,6-四甲基-3,5-庚二酸)铋	142617-53-6	916543
Tetrakis(ethylmethylamino)vanadium(IV), 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 四(乙基甲基氨基)钒(IV)	791114-66-4	2445938
Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)strontium tetraglyme adduct, 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 双(2,2,6,6-四甲基-3,5-庚二酮酸)锶四甘醇二甲醚加成物	150939-76-7	529991
Hexakis(dimethylamino)dialuminum, 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 三(二甲胺基)铝二聚体	32093-39-3	572062
Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)barium hydrate, 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 双(2,2,6,6-四甲基-3,5-庚二酮酸)钡	17594-47-7	924172
Diethylaminolithium, 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 二乙氨基锂(I)	816-43-3	540112
Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)calcium, 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 二(2,2,6,6-四甲基-3,5-庚二酮酸)钙(II)	118448-18-3	988511
Lithium cyclopentadienide, ≥99.99% trace metal analysis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 环戊二烯基锂(I)	16733-97-4	948701
Vanadium (V) tri-i-propoxy oxide, 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 三(异丙氧基)氧化钒(V)	5588-84-1	946165
Bis(diethylamino)silane, 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 二(二乙氨基)硅烷	27804-64-4	957403
Bis(t-butylamino)silane, 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 二(叔丁基氨基)硅烷	186598-40-3	474608
(t-Butylimido)tris(ethylmethylamino)tantalum(V), 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 三(乙基甲氨基)(叔丁基亚氨基)钽(V)	511292-99-2	345773
(t-Butylimido)tris(diethylamino)tantalum(V), 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 三(二乙氨基)(叔丁基亚氨基)钽(V)	169896-41-7	289272
(t-Butylimido)tris(diethylamino)niobium(V), 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 三(二乙氨基)(叔丁基亚氨基)铌(V)	210363-27-2	1177614
(t-Butylimido)tris(methylethylamino)niobium, 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 三(乙基甲氨基)(叔丁基亚氨基)铌(V)	864150-47-0	1177615
Niobium(V) ethoxide , 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 五乙醇铌(V)	3236-82-6	963633
Tris(N,N-bis(trimethylsilyl)amide)lanthanum(III), 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 三[N,N-二(三甲基硅烷基)氨基]镧(III)	35788-99-9	116668
Bis(N,N'-di-t-butylacetamidinato)nickel(II), 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 二(N,N'-二-叔丁基乙脒基)镍(II)	940895-79-4	1751074
Bis{[μ-[[di(trimethylsilyl)amide]}bis{[di(trimethylsilyl)amide]}dicobalt(II), 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 双{[μ-[[二(三甲基甲硅烷基)酰胺]}双{[[[二三甲基甲硅烷基)酰胺]}双钴(II)	93280-44-5	1880209
Tris[N,N-bis(trimethylsilyl)amide]yttrium(III), 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 三[N,N-双(三甲基硅烷)胺]钇(III)	41836-28-6	948974
Alane-N,N-dimethylethylamine complex , 99%, metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder N,N-二甲基乙胺醛烷络合物	124330-23-0	535459
Bis(N,N-di-isopropyl acetamidinyl) calcium dimer, 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 二(异丙基乙脒基)钙	1959584-79-2	9393978
DimethylAminopropyl-Dimethyl Indium, 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder [3-(二甲氨基)丙基]二甲基铟	120441-92-1	999241
Tetrakis(diethylamino)titanium(IV), 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 四(二乙氨基)钛(IV)	4419-47-0	903906
Tetrakis(ethylmethylamino)titanium, 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 四(乙基甲氨基)钛(IV)	175923-03-2	9186316
Cyclopentadienyl Tris(dimethylamino) Zirconium, 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder (环戊二烯基)三(二甲氨基)锆	33271-88-4	1177621
Zirconium, tris(N-methylmethanaminato)[(1,2,3,4,5-η)-1-propyl-2,4-cyclopentadien-1-yl], 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder (正丙基环戊二烯基)三(二甲氨基)锆(IV)	2192174-63-1	9394093
Tetrakis(diethylamino)hafnium, 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 四(二乙氨基)铪(IV)	19824-55-6	113501
Bis(pentamethylcyclopentadienyl)magnesium, 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 双(五甲基环戊二烯基)镁	74507-64-5	229956
Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)ruthenium(III), 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 三(2,2,6,6-四甲基-3,5-庚二酮酸)钌	38625-54-6	147692
Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)yttrium(III) triglyme adduct, 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 三(2,2,6,6-四甲基-3,5-庚二酮酸)钇	15632-39-0	996636
Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)nickel(II), 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 二(2,2,6,6-四甲基-3,5-庚二酮酸)镍(II)	14481-08-4	990065
Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)erbium(III), 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 三(2,2,6,6-四甲基-3,5-庚二酮酸)铒(III)	35733-23-4	933034
Antimony(III) ethoxide, 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 乙醇锑	10433-06-4	905481
Bis(t-butylimido)bis(dimethylamino)molybdenum(VI), 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 二(二甲基氨基)二(叔丁基亚氨基)钼(VI)	923956-62-1	1822342
Bis(cyclopentadienyl)magnesium, 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 二(环戊二烯基)镁(II)	1284-72-6	951035
Tin(II) acetylacetonate, 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 二(乙酰丙酮酸)锡(II)	16009-86-2	111772
Bis(ethylcyclopentadienyl)manganese, 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 二(乙基环戊二烯基)锰(II)	101923-26-6	953383
Bis(t-butylimido)bis(dimethylamino)tungsten(VI), 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 二(二甲氨基)二(叔丁基亚氨基)钨(VI)	406462-43-9	918995
Bis(methylcyclopentadienyl)nickel, 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 二(甲基环戊二烯基)镍(II)	1293-95-4	930278
bis(dimethylamino-2-methyl-2-butoxo)nickel, 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 二(二甲氨基-2-甲基-2-丁氧基)镍(II)	942311-35-5	9181010
Bis(cyclopentadienyl)cobalt(II), 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 双(环戊二烯基)钴	1277-43-6	941710
Tris(cyclopentadienyl)yttrium, 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 三(环戊二烯)化钇	1294-07-1	320377
(3,3-Dimethyl-1-butyne)dicobalt hexacarbonyl, 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder (3,3-二甲基-1-丁炔)六羰基二钴(0)	56792-69-9	280361
Bis(pentamethylcyclopentadienyl)barium, 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 双(五甲基环戊二烯)钡	112379-49-4	1415112
Bis(pentamethylcyclopentadienyl)cobalt, 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 双(五甲基环戊二烯基)钴(II)	74507-62-3	924019
Tris(methylcyclopentadienyl)yttrium, 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 三(甲基环戊二烯)化钇(III)	329735-72-0	634274
2,3-Dimethyl-1,3-butadiene-tricarbonyl ruthenium, 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder (2,3-二甲基-1,3-丁二烯)三羰基钌(0)	52649-53-3	9248430

推荐阅读

Strem优势产品推荐——用于ALD/CVD的铂前体
太阳能电池原子层沉积（ALD）前驱体