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纯度
全部
-
(cis + trans), 90%, technical grade
> 97 %
> 97%
>85%
>90%
>90%%+
>92%
>94%
>94%+
>95.0%(GC)%+
>95.0%(HPLC)%+
>95%
>95%%+
>96.0%(GC)%+
>96%
>97
>97.0%(GC)%+
>97%
>97%%+
>98.0%(GC)%+
>98.0%(T)%+
>98%
>98%%+
>99.0%(GC)%+
>99%%+
~0.5?M in dichloromethane, ≥97.0% (GC)
~28% active chlorine basis
~38% Pt basis
~95%, crystalline
≤77%
≥50% (via Cl), 50% in H2O
≥90%
≥92.0% (HPLC)
≥92.5%
≥93.0% (HPLC)
≥94%
≥95.0%
≥95.0% (AT)
≥95.0% (GC)
≥95.0% (HPLC)
≥95.0% (T)
≥95%
≥95% (titration)
≥96.0%
≥96.0% (AT)
≥96.0% (calc. on dry substance, AT)
≥96%
≥97.0%
≥97.0% (AT)
≥97.0% (GC)
≥97.0% (H-NMR)
≥97.0% (HPLC)
≥97.0% (HPLC/AT)
≥97.0% (NT)
≥97.0% (sum of enantiomers, GC)
≥97.0% (T)
≥97%
≥98.0%
≥98.0% (AT)
≥98.0% (CHN)
≥98.0% (GC)
≥98.0% (HPLC)
≥98.0% (T)
≥98.0% (TLC)
≥98.5% (AT)
≥98.5% (GC)
≥98.5% (T)
≥98%
≥99.0%
≥99.0% (GC)
≥99.0% (HPLC)
≥99.0% (T)
≥99.5%
≥99.5% (GC)
≥99.99% trace metals basis
≥99%
0.5?M in THF
0.97%+
1?M in acetic acid
1?M in hexanes
1.0?M in diethyl ether
1.0?M in methylene chloride
1.0?M in THF
1.0?M in toluene
18?mM in acetone, for chiral derivatization
2.0?M in methylene chloride
2.0?M in THF
200-400?mesh, extent of labeling: 0.5-1.0?mmol/g loading
200-400?mesh, extent of labeling: 1.2?mmol/g loading
200-400?mm bead size, ~20?% (silica gel), on silica gel
230-400?mesh, extent of labeling: ~2.5% loading, matrix active group ~8% functio
25?wt. % in H2O
3?M in methylene chloride
40-63?μm, extent of labeling: 1.5?mmol/g loading
40%
50-65?wt. % in heptane
50-65?wt. % in hexanes
50?wt. % in toluene
60:40% (w/w)
60%
62.0%(GC)
65-75?wt. % in α-pinene
65.0%(GC)
65%
70?wt. % in toluene
70.0%(GC)
70.0%(LC)
70%
75%, technical grade
8
80.0%(GC)
80.0%(T)
80%
80% in H2O
83.0%(GC)
85.0%(GC)
85.0%(LC)
85.0%(LC&T)
85.0%(T)
85.0%%+
85%
85%, technical grade
87%
88.0%(GC)
88%
89.0%(GC)
9+%
90
90-105% (approx.)
90.0%(GC)
90.0%(GC&T)
90.0%(LC)
90.0%(T)
90.0%%+
90%
90%, technical grade
90%%+
90+%
91%
92.0%(GC)
92.0%(T)
92%
92%%+
93.0%(GC)
93.0%(GC&T)
93.0%(LC)
93.0%(T)
93%
94.0%(GC)
94.0%(T)
94%
94%%+
95.0%(GC)
95.0%(GC&NMR)
95.0%(GC&T)
95.0%(LC)
95.0%(LC&N)
95.0%(LC&T)
95.0%(N)
95.0%(T)
95.0%(T&GC)
95.0%(T&LC)
95.0%%+
95%
95%%+
95%+
95%+%+
95+%
95+%%+
96.0%(GC)
96.0%(GC&T)
96.0%(LC)
96.0%(LC&N)
96.0%(LC&T)
96.0%(N)
96.0%(T)
96%
96%%+
96+%
97 atom % D, contains hydroquinone as stabilizer
97.0%(GC)
97.0%(GC&N)
97.0%(GC&T)
97.0%(LC)
97.0%(LC&N)
97.0%(LC&T)
97.0%(N)
97.0%(N&T)
97.0%(T)
97.0%%+
97.5%
97%
97%, contains 0.1% hydroquinone as stabilizer
97%, contains 500?ppm 4-tert-butylcatechol as inhibitor
97%, optical purity ee: 97% (GLC)
97%, optical purity ee: 98% (GLC)
97%%+
97+%
98 atom % D
98.0%(GC)
98.0%(GC&N)
98.0%(GC&T)
98.0%(LC)
98.0%(LC&N)
98.0%(LC&QNMR)
98.0%(LC&T)
98.0%(N)
98.0%(N&T)
98.0%(T)
98.0%(T&GC)
98.0%(T&LC)
98.0%%+
98.5%
98.5%(T)
98%
98% (H-NMR)
98%, contains 0.1% 3,5-di-tert-butylcatechol as stabilizer
98%%+
98+%
98+%%+
99.0%(GC)
99.0%(GC&T)
99.0%(LC)
99.0%(LC&T)
99.0%(T)
99.0%(T&LC)
99.0%%+
99.3%
99.5%
99.5%(GC)
99.7%
99.8%
99.85%
99.998% trace metals basis
99.999% trace metals basis
99%
99%, contains 300?ppm triethanolamine as stabilizer, 50?ppm MEHQ as stabilizer
99%%+
AldrichCPR
anhydrous, beads, ?10?mesh, 99.99% trace metals basis
anhydrous, powder, 99.99% trace metals basis
approx. 20 wt. % on basic alumina
available chlorine 68?%
BASF quality, ≥95%
BASF quality, 95%
certified by the Biological Stain Commission, Dye content 70?%
ChiPros?, produced by BASF, ≥95%
ChiPros?, produced by BASF, ≥99.0%
ChiPros?, produced by BASF, ≥99%
ChiPros?, produced by BASF, 98%
ChiPros?, produced by BASF, 98%, ≥97.5% (HPLC)
chloride form
contains ~250?ppm Pentaerythritol tetrakis(3,5-di-tert-butyl-4-hydroxyhydrocinna
contains ≥3% 2-propanol as stabilizer, 97%
contains potassium carbonate as stabilizer, 98%
contains sodium/potassium carbonate as stabilizer, 97%
crystalline
deposition grade, ≥98% (GC), ≥99.99% (as metals)
dry, ≥98.0% (T)
dry, ≥98.5% (HPLC)
Dye content ~85?%
Dye content ~90?%
Dye content ~95?%
Dye content 15?%
Dye content 70?%
Dye content 80?%
Dye content 85?%
Dye content 90?%
Dye content 95?%
Dye content 99?%
for electrochemical analysis, ≥99.0%
for energy applications
in excess methyl sulfide
indicator grade
Lonza quality, ≥97.0% (GC)
Lonza quality, ≥99.5% (w/w)
Lonza quality, 99.0-100.3% (w/w) (T)
low HCl, 97%
min. 90%
min. 95%
min. 97%
min. 98%
mix of α and β anomers
Mixture of 3- and 4-isomers, 97%, contains 700-1100?ppm nitromethane as inhibito
N/A
NMR reference standard, 5% in acetone-d6 (99.9 atom % D)
optical purity ee: 97% (GLC)
optical purity ee: 99% (GLC)
packaged for use in deposition systems
produced by BASF, ≥95%
produced by Wacker Chemie AG, Burghausen, Germany
produced by Wacker Chemie AG, Burghausen, Germany, ≥92% n- and iso-isomer basis
produced by Wacker Chemie AG, Burghausen, Germany, ≥96.0% (GC)
produced by Wacker Chemie AG, Burghausen, Germany, ≥96% (GC)
produced by Wacker Chemie AG, Burghausen, Germany, ≥98.0% (GC)
produced by Wacker Chemie AG, Burghausen, Germany, ≥99.0%
produced by Wacker Chemie AG, Burghausen, Germany, ≥99.0% (GC)
produced by Wacker Chemie AG, Burghausen, Germany, 70% in toluene
purified by redistillation, ≥99%
purified by sublimation, ≥99%
puriss., ≥99.0% (GC)
puriss., 98%
purum, ≥98.5% (HPLC/T)
purum, ≥99.0% (AT)
purum, mixture of isomers (~70% meta + ~30% para), ≥95.0% (GC)
reagent grade, 97%
reagent grade, 98%
ReagentPlus?, ≥99%
ReagentPlus?, 99%
ReagentPlus?, 99%, contains ≤1% propylene oxide as stabilizer
size 8?8.5 L
size M
size S
size XXL
tech
tech%+
technical grade
technical grade, ~85%
technical grade, ≥90%
technical grade, 85%
technical grade, 90%
technical grade, 92%
technical grade, 95%
technical grade, 96%
technical, (cis+trans), mixture of cis- and trans-isomers (~1:6), ~70% (GC)
technical, ~45% in H2O (T)
technical, ~60% (NMR)
technical, ~85% (HPLC)
technical, ≥85% (GC)
technical, ≥90%
technical, ≥90% (AT)
technical, ≥90% (GC)
technical, ≥90% (S)
technical, ≥93.0% (GC)
technical, ≥95.0% (T)
technical, ≥95% (GC)
technical, ≥97.0% (GC)
technical, ≥97.0% (GC/T)
UN1993
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1set
2.5g
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200mg
200umol
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