全部
-
(99.9+%-Nb)
(99.99%-Ti)
(99.99+%-Ge)
(99.99+%-Ta
(99.9999%-Ta)
>97%
>98%
>99%%+
~1.5?M in cyclohexane, liquid, orange
~10% in methanol (T, ~2.2 M)
~10% in methanol (T)
~20% in H2O (T)
~20% in methanol (T)
~25% in H2O (1.68 M)
~25% in methanol (~1.5 M)
~25% in methanol (T)
~3.4?M in 2-methyltetrahydrofuran
~40% in ethanol (NT)
~40% in H2O
~40% in H2O (T)
≥85%
≥95.0% (T)
≥95%
≥97.0%
≥97.0% (GC)
≥97%
≥98%
≥99.5%
≥99.95% trace metals basis
≥99.99% trace metals basis
≥99%
0.5?M in benzene: cyclohexane
0.5?M in diethyl ether
0.5?M in ethyl acetate
0.5?M in THF
0.5?M in toluene
0.7?M in diethyl ether/hexanes
0.70 ?M in THF
1?M in ether and hexanes
1?M in ethyl acetate
1?M in tert-butyl methyl ether
1?M in THF
1?M in toluene
1.0?M in dibutyl ether
1.0?M in diethyl ether
1.0?M in ethanol
1.0?M in hexanes
1.0?M in methanol
1.0?M in pentane
1.0?M in tert-butyl methyl ether
1.0?M in THF
1.0?M in THF/hexanes
1.2?M in THF
1.3?M in THF
1.4?M in butyl diglyme
1.4?M in THF
1.4?M in THF: toluene (1:3)
1.45?M in butyl diglyme
1.5?M in cyclohexane
1.5?M in diethyl ether
1.8?M in THF/heptane/ethylbenzene
10?wt. % in H2O
10?wt. % suspension in hexanes
2-propanol solution in toluene with 0.2% 1,10-phenanthroline
2?M in THF
2.0?M in diethyl ether
2.0?M in THF
2.0?M in THF/heptane/ethylbenzene
2.9?M in 2-methyltetrahydrofuran
20?wt. % in H2O
20% in methanol (NT)
21% in H2O
24.0-26.0% (in H2O)
25?wt. % in toluene
3.0?M in diethoxymethane
3.0?M in diethyl ether
3.0?M in THF
3.4?M in 2-methyltetrahydrofuran
3% in 2-Methyltetrahydrofuran/cumene
35?wt. % in H2O
40?wt. % in H2O
40?wt. % in methanol
45?wt. % in methanol
46?wt. % in H2O
50?wt. % suspension in toluene
6-10?wt. % in methanol
75?wt. % in isopropanol
85%
90%
90%, technical grade
95.0%(GC&T)
95.0%(T)
95%
95%%+
95+%
96.0%(T)
96%
97.0%(GC)
97.0%(T)
97%
98.0%(GC)
98.0%(GC&T)
98.0%(LC&T)
98.0%(T)
98.5%
98%
98%%+
99.0%(GC)
99.0%(GC&T)
99.0%(T)
99.5%
99.7%
99.8%
99.8% trace metals basis
99.9%
99.9% trace metals basis
99.95% trace metals basis
99.98% trace metals basis
99.99%
99.99% trace metals basis
99.99% trace metals basis (purity excludes ~2000 ppm zirconium.)
99.999% trace metals basis
99%
99+%
deposition grade
electronic grade, 99.999% trace metals basis
hydrogen-storage grade
Loading: 0.04 mmol tablet.
Lonza quality, ≥97.0% (w/w) (T)
min. 90%
min. 95%
min. 97%
min. 98%
min. 99%
N/A
packaged for use in deposition systems
powder, 99.9% trace metals basis
produced by Wacker Chemie AG, Burghausen, Germany, 40% in THF
reagent grade, ≥98%
ReagentPlus?, ≥99%
sublimed grade, 99.99% trace metals basis
technical grade
technical, ≥90% (KT)