有机化学
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Amethyst
J&K
Fluorochem
Strem
Accela
Apollo
Matrix
Rieke Metals
SERVA
TCI
TRC
Aldrich
纯度
全部
-
(99.9+%-Nb)
(99.99%-Ti)
(99.99+%-Ge)
(99.99+%-Ta
(99.9999%-Ta)
>97%
>98%
>99%%+
~1.5?M in cyclohexane, liquid, orange
~10% in methanol (T, ~2.2 M)
~10% in methanol (T)
~20% in H2O (T)
~20% in methanol (T)
~25% in H2O (1.68 M)
~25% in methanol (~1.5 M)
~25% in methanol (T)
~3.4?M in 2-methyltetrahydrofuran
~40% in ethanol (NT)
~40% in H2O
~40% in H2O (T)
≥85%
≥95.0% (T)
≥95%
≥97.0%
≥97.0% (GC)
≥97%
≥98%
≥99.5%
≥99.95% trace metals basis
≥99.99% trace metals basis
≥99%
0.5?M in benzene: cyclohexane
0.5?M in diethyl ether
0.5?M in ethyl acetate
0.5?M in THF
0.5?M in toluene
0.7?M in diethyl ether/hexanes
0.70 ?M in THF
1?M in ether and hexanes
1?M in ethyl acetate
1?M in tert-butyl methyl ether
1?M in THF
1?M in toluene
1.0?M in dibutyl ether
1.0?M in diethyl ether
1.0?M in ethanol
1.0?M in hexanes
1.0?M in methanol
1.0?M in pentane
1.0?M in tert-butyl methyl ether
1.0?M in THF
1.0?M in THF/hexanes
1.2?M in THF
1.3?M in THF
1.4?M in butyl diglyme
1.4?M in THF
1.4?M in THF: toluene (1:3)
1.45?M in butyl diglyme
1.5?M in cyclohexane
1.5?M in diethyl ether
1.8?M in THF/heptane/ethylbenzene
10?wt. % in H2O
10?wt. % suspension in hexanes
2-propanol solution in toluene with 0.2% 1,10-phenanthroline
2?M in THF
2.0?M in diethyl ether
2.0?M in THF
2.0?M in THF/heptane/ethylbenzene
2.9?M in 2-methyltetrahydrofuran
20?wt. % in H2O
20% in methanol (NT)
21% in H2O
24.0-26.0% (in H2O)
25?wt. % in toluene
3.0?M in diethoxymethane
3.0?M in diethyl ether
3.0?M in THF
3.4?M in 2-methyltetrahydrofuran
3% in 2-Methyltetrahydrofuran/cumene
35?wt. % in H2O
40?wt. % in H2O
40?wt. % in methanol
45?wt. % in methanol
46?wt. % in H2O
50?wt. % suspension in toluene
6-10?wt. % in methanol
75?wt. % in isopropanol
85%
90%
90%, technical grade
95.0%(GC&T)
95.0%(T)
95%
95%%+
95+%
96.0%(T)
96%
97.0%(GC)
97.0%(T)
97%
98.0%(GC)
98.0%(GC&T)
98.0%(LC&T)
98.0%(T)
98.5%
98%
98%%+
99.0%(GC)
99.0%(GC&T)
99.0%(T)
99.5%
99.7%
99.8%
99.8% trace metals basis
99.9%
99.9% trace metals basis
99.95% trace metals basis
99.98% trace metals basis
99.99%
99.99% trace metals basis
99.99% trace metals basis (purity excludes ~2000 ppm zirconium.)
99.999% trace metals basis
99%
99+%
deposition grade
electronic grade, 99.999% trace metals basis
hydrogen-storage grade
Loading: 0.04 mmol tablet.
Lonza quality, ≥97.0% (w/w) (T)
min. 90%
min. 95%
min. 97%
min. 98%
min. 99%
N/A
packaged for use in deposition systems
powder, 99.9% trace metals basis
produced by Wacker Chemie AG, Burghausen, Germany, 40% in THF
reagent grade, ≥98%
ReagentPlus?, ≥99%
sublimed grade, 99.99% trace metals basis
technical grade
technical, ≥90% (KT)
规格
全部
0.25mole
0.2mole
1.5kg
1000g
100g
100ml
100tab
10g
10kg
10ml
10tab
1g
1kg
1l
1mole
1sample
2.5kg
2.5l
200ml
25000g
2500ml
250g
250ml
25g
25ml
2g
2kg
2l
3g
500g
500mg
500ml
50g
50ml
5g
5kg
5l
5ml
600ml
750g
75g
800ml
80kg
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